|本期目录/Table of Contents|

 石英晶片剪切增稠抛光优化实验(PDF)

《纳米技术与精密工程》[ISSN:1672-6030/CN:12-1351/O3]

期数:
2017年3期
页码:
227-233
栏目:
精密加工
出版日期:
2017-05-15

文章信息/Info

Title:
Optimization Experiments for Shear Thickening Polishing of
Quartz Substrates
文章编号:
1672-6030(2017)03-0227-07
作者:
 

翁海舟1 吕冰海1 胡刚翔2 邵琦1 戴伟涛1

 (1. 浙江工业大学超精密加工研究中心, 杭州310014; 2. 金华出入境检验检疫局, 金华321015)
Author(s):
 Weng Haizhou1 Lü Binghai1 Hu Gangxiang2 Shao Qi1 Dai Weitao1
 (1. Ultra-Precision Machining Center, Zhejiang University of Technology, Hangzhou 310014, China;
2. Jinhua Entry Exit Inspection and Quarantine Bureau, Jinhua 321015, China)
关键词:
 石英晶片 剪切增稠抛光 抛光液转速 工件倾斜角度 磨粒质量分数 磨粒粒度
Keywords:
 quartz substrate shear thickening polishing polishing speed workpiece inclination angle abrasive mass fraction abrasive size
分类号:
TG580.6
DOI:
10.13494/j.npe.20160087
文献标识码:
A
摘要:
 剪切增稠抛光(STP)是利用非牛顿流体抛光液在抛光过程中产生的剪切增稠效应实现工件表面高效、低损伤的抛光.本文以材料去除率和表面粗糙度作为评价指标;采用田口法对石英晶片剪切增稠抛光过程中的4个关键影响参数:抛光液转速、工件倾斜角度、磨粒粒度、磨粒质量分数进行优化实验分析,得到最优抛光参数组合以及各主要工艺参数对抛光效果的影响程度;通过实验验证了优化结果的可靠性.对于材料去除率,工件倾斜角度的影响最明显,抛光液转速次之,再次是磨粒质量分数,磨粒粒度影响最小;对于表面粗糙度,抛光液转速的影响最明显,工件倾斜角度次之,再次是磨粒质量分数,磨粒粒度影响最小.通过信噪比平均响应分析,材料去除率优化参数组合为:Al2O3 2 500#、磨粒质量分数18%、抛光液转速80 r/min、工件倾斜角度15°,石英晶片材料去除率最高达到12.25 μm/h;石英晶片最佳表面粗糙度参数组合为:Al2O3 5 000#、磨粒质量分数18%、抛光液转速80 r/min、工件倾斜角度15°,抛光1 h后石英晶片表面粗糙度Ra由300.08 nm降低至4.26 nm. 
Abstract:
Shear thickening polishing (STP) achieves high efficiency and low damage to the surface of the workpiece by using the shear thickening effect of nonNewtonian fluid slurry produced in the process. Taking the material removal rate (MRR) and surface roughness (Ra) of the workpiece as evaluation indexes, the influence of four key parameters, namely polishing speed, workpiece inclination angle, abrasive mass fraction, and abrasive size on the STP process of quartz substrates were analyzed by Taguchi method, and the optimized results were verified through experiments. Inclination angle exerts the most significant effect on MRR, followed by the polishing speed, abrasive mass fraction, and abrasive size. Polishing speed exerts the most significant effect on Ra, followed by inclination angle, abrasive mass fraction and abrasive size. Based on the SNR average response analysis, MRR reached the highest value of 12.25 μm/h under the conditions of 2500# Al2O3, 18% abrasive mass fraction, 15° inclination angle and 80 r/min polishing speed. On the other hand, the surface quality was the best under the conditions of 5000# Al2O3, 18% abrasive mass fraction, 15° inclination angle and 80 r/min polishing speed. After 1 hour’s processing, the surface roughness was reduced rapidly from Ra=300.08 nm to Ra=4.26 nm.

参考文献/References

备注/Memo

备注/Memo:
收稿日期: 2017-02-20.
基金项目: 国家自然科学基金资助项目(51175166,51275476);浙江省科技计划公益资助项目(2013C31014).
作者简介: 翁海舟(1992— ),男,硕士研究生.
通讯作者: 吕冰海,研究员,icewater7812@126.com.
更新日期/Last Update: 2017-07-11