|本期目录/Table of Contents|

单晶金刚石机械研磨与化学机械抛光工艺(PDF)

《纳米技术与精密工程》[ISSN:1672-6030/CN:12-1351/O3]

期数:
2015年2期
页码:
102-107
栏目:
精密加工
出版日期:
2015-03-15

文章信息/Info

Title:
Mechanical Lapping and Chemical Mechanical Polishing Process for Single Crystal Diamond
作者:
薛洪明 金洙吉史卓颖
大连理工大学精密与特种加工教育部重点实验室,大连 116024
Author(s):
Xue Hongming Jin Zhuji Shi Zhuoying
Key Laboratory for Precision and Nontraditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, China
关键词:
单晶金刚石机械研磨化学机械抛光
Keywords:
single crystal diamond mechanical lapping chemicalmechanical polishing
分类号:
TB383
DOI:
DOI 10.13494/j.npe.20140113
文献标识码:
A
摘要:
单晶金刚石在工业、国防等领域的应用日益广泛,对其加工表面质量的要求不断提高,使用常温低压的化学机械抛光可实现金刚石的超光滑低损伤表面加工.通过理论分析及实验研究得出,使用硅酸盐玻璃材质研磨盘进行研磨加工,可以将金刚石表面粗糙度Ra降至15~25 nm,且无明显机械划痕;在2 MPa压力及室温环境下进行单晶金刚石化学机械抛光实验,优选出Fenton试剂酸性水基抛光液,使用该抛光液抛光单晶金刚石可获得粗糙度Ra值4 nm以下的光滑表面.
Abstract:
Single crystal diamond is more and more widely used in national defense and industrial field, which requires better surface quality. The technique of chemicalmechanical polishing at normaltemperature and lowpressure environment can achieve ultrasmooth diamond surface with low damage. Theoretical analysis and experimental research show that the polished diamond surface roughness Ra can be reduced to 15—25 nm without obvious mechanical scratches by using silicate glass as grinding disc. The chemicalmechanical polishing experiment was held under the condition of 2 MPa pressure and normaltemperature. Experimental results show that the water based acidic Fenton reagent was effective in particular process parameters, and overall surface roughness Ra was processed to be less than 4 nm.

参考文献/References

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备注/Memo

备注/Memo:
收稿日期: 2015-02-11.基金项目: 国家重点基础研究发展计划(973计划)资助项目(2011CB706704);创新研究群体科学基金资助项目(51321004).作者简介: 薛洪明(1988—), 男, 硕士生, xhm0310@163.com.通讯作者: 金洙吉, 教授, kimsg@dlut.edu.cn.
更新日期/Last Update: 2015-05-12