|本期目录/Table of Contents|

 任意形状图形的灰度掩模图的设计系统研究(PDF)

《纳米技术与精密工程》[ISSN:1672-6030/CN:12-1351/O3]

期数:
2013年2期
页码:
152-158
栏目:
微机电系统
出版日期:
2013-03-15

文章信息/Info

Title:
 Gray-Scale Mask Design System of Arbitrary Shaped Pattern
作者:
 杜立群12 冼宗明2 王大志1
 1. 大连理工大学精密与特种加工教育部重点实验室,大连116024;
2. 大连理工大学微纳米技术及系统辽宁省重点实验室,大连116024
Author(s):
 Du Liqun12 Xian Zongming2 Wang Dazhi1
 1. Key Laboratory for Precision and Non-Traditional Machining of Ministry of Education, Dalian University of
Technology, Dalian 116024, China; 2. Key Laboratory for Micro/Nano Technology and System of
Liaoning Province, Dalian University of Technology, Dalian 116024, China
关键词:
 灰度掩模设计算法铺路法任意形状图形ObjectARX
Keywords:
 gray-scale mask design algorithm paving method arbitrary shaped pattern ObjectARX
分类号:
-
DOI:
-
文献标识码:
A
摘要:
 灰度掩模技术是制作三维微纳结构的有效方法之一, 灰度掩模图设计是灰度掩模技术的重要组成部分.目
前,在微机械器件制作领域中,通常只给出常用规则形状三维结构对应的灰度掩模图的设计方法,对于任意形状图
形的灰度掩模图设计鲜有报道. 本文综合灰度光刻技术中的编码原理和有限元法中的铺路法,提出了适合于任意形
状图形的灰度掩模图设计算法,解决了误差处理和图形闭合两个关键问题,给出了算法及图形的评价方法,并利用
AutoCAD二次开发工具ObjectARX研究了算法的程序实现, 构建了灰度掩模图的设计系统. 利用该系统设计了多幅
常规规则形状和任意形状灰度掩模图,结果表明,该系统可以高效地设计任意形状图形的灰度掩模. 研究工作为任
意形状图形灰度掩模图的设计提供了一种新方法,可以提高灰度掩模图的设计效率,为三维微纳器件的制作提供技
术积累.
Abstract:
 Gray-scale mask technology is one of the most effective methods to fabricate three-dimensional 
micro/nano-structures in micro electro mechanical system. The gray-scale mask design is
the key of gray-scale mask technology. However, the existing methods for gray-scale mask design are
just applied to the specific regular patterns. In this paper, based on the coding theory in gray-scale
lithography and the paving method in finite element analysis, a novel algorithm used for gray-scale
mask design of arbitrary shaped pattern was proposed. The key problems of pattern closure and
algorithmic error were solved. The algorithmic evaluation was given. The computer program of this
algorithm was developed by ObjectARX in AutoCAD. Several examples including regular shaped
patterns and arbitrary shaped patterns were accomplished through the program. The results indicate that
the algorithm is applied to designing gray-scale mask with arbitrary shaped pattern efficiently. The
method presented in this paper possesses the advantage of simple design program, and provides
technology accumulation for the fabrication of three-dimensional micro/nano-structures.

参考文献/References

备注/Memo

备注/Memo:
更新日期/Last Update: 2013-03-25